File:Common SiO2 vs high-k gate stack (DE).svg
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[edit]DescriptionCommon SiO2 vs high-k gate stack (DE).svg |
English: Comparison of high-k dielectric structure with conventional silicon dioxide gate dielectric. Schematic is a graphical representation of an idea in the presentation by G. E. Moore, Intel Inc.
Deutsch: Vergleich eines konventionellen Gate-Schichtstapel mit Siliziumdioxid als Dielektrikum mit dem eines in High-k+Metal-Gate-Technik (vereinfachte Darstellung) hergestellten Gate-Schichtstapels. Das Schema wurde in Anlehung einer Präsentation von G. E. Moore, Intel Inc., erstellt |
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This is a retouched picture, which means that it has been digitally altered from its original version. Modifications: translation to german, thickness ratio fixed, colored. The original can be viewed here: High-k.svg: . Modifications made by Cepheiden.
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[edit]This image is a derivative work of the following images:
- File:High-k.svg licensed with Cc-by-sa-3.0-migrated-with-disclaimers, GFDL-en, GFDL-user-en-note
- 2008-01-14T18:14:30Z Stannered 401x235 (8539 Bytes) {{Information |Description=Comparison of high-k dielectric structure with conventional silicon dioxide gate dielectric. Schematic is my graphical representation of an idea in the presentation by G. E. Moore, Intel Inc. |Sourc
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Date/Time | Thumbnail | Dimensions | User | Comment | |
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current | 08:52, 20 February 2010 | 401 × 235 (7 KB) | Cepheiden (talk | contribs) | svg fix | |
08:51, 20 February 2010 | 401 × 235 (7 KB) | Cepheiden (talk | contribs) | small fixes | ||
08:45, 20 February 2010 | 401 × 235 (7 KB) | Cepheiden (talk | contribs) | {{Information |Description={{en|Comparison of high-k dielectric structure with conventional silicon dioxide gate dielectric. Schematic is a graphical representation of an idea in the presentation by G. E. Moore, Intel Inc.}} {{de|Vergleich eines konventio |
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